News & Blog

Nanofabrication Using Glancing Angle Deposition

Glancing angle deposition (GLAD) is a nanofabrication technique that is an extension of oblique angle deposition in which the substrate incline is manipulated during film deposition.
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Come Visit Intlvac Thin Film at SPIE Defense and Commercial Sensing

Intlvac Thin Film is pleased to be among the 380 exhibiting companies at this unique international conference where photonics and immerging technologies of the future intersect.
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Looking Forward to SPIE Photonics West 2019

Over 20,000 people attend the photonics and laser industry’s flagship event each year. Photonics West includes the entire spectrum of light-driven technologies and attracts researchers, companies and product developers from around the world.
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Intlvac Thin Film Joins NanoCanada Mission to Tokyo in January 2019

Intlvac Thin Film is pleased to be part of the Canadian pavilion at this exciting event. We welcome the opportunity to meet with our Japanese customers and colleagues during the few days that we are there.
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Will We See You at 2019 Joint MMM-Intermag Conference in January?

Intlvac Thin Film looks forward to participating in the 2019 Joint MMM-Intermag Conference at Wardman Park Mariott in Washington, DC from January 14 to 18, 2019.
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Intlvac Introduces the Nanochrome IV UV VIS Optical Filter Production System

Intlvac Thin Film is pleased to introduce their newest precision optical coating platform, the Nanochrome IV UV/Vis Optical Filter Production System. The Nanochrome IV system is designed to produce complex optical filters, anti-reflective coating, dielectric and UV Vis filters via e-beam evaporation with ion assist.
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Advantages of Ion Beam Sputter Deposition

Ion Beam Sputter Deposition (IBSD) is a physical vapor deposition method which utilizes a remote broad ion/plasma beam source to bombard a grounded (floating) target and sputter target material onto a substrate.
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Understanding Ion Beam Etching (Milling)

Ion Beam Etching (or Milling) is a dry plasma etch method which utilizes a remote broad beam ion/plasma source to remove substrate material by physical inert gas and/or chemical reactive gas means. Like other dry plasma etch techniques, the typical figures of merit apply, such as etch rate, anisotropy, selectivity, uniformity, aspect ratio, and substrate damage. However, ion beam etching advances additional dry etch merits, which include wide range of materials, precision etch stops, indiffere...
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What is Sputtering?

Sputtering is a thin-film manufacturing process widely used across many industries including semiconductor processing, precision optics, and surface finishing. Sputtered thin films have excellent uniformity, density and adhesion making them ideal for multiple applications.
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