Systems

  • Nanoquest I

    The Nanoquest I Ion Beam Etching system is an ideal platform for etching single wafer substrates up to 6".

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  • Nanoquest II

    Designed for clean room operation, the Nanoquest II keeps the etch module in the service area of the clean room.

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  • Nanoquest III

    The Nanoquest III Batch Ion Beam Etching System is one of the most economical and versatile production ion beam etch systems on the market.

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  • Nanochrome Pico

    The Nanochrome Pico is the ultimate all-purpose prototyping and R&D physical vapor deposition (PVD) platform on the market.

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  • Nanochrome I

    Nanochrome I is an R&D / Pilot Electron Beam Evaporator with a variety of possible configurations.

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  • Nanochrome II

    Intlvac's PVD systems are available with an automated load-locked substrate transfer option.

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  • Nanochrome IV

    The Nanochrome IV Plasma Assisted Reactive Magnetron Sputtering produces dielectric thin film layers with final reaction and film densification at the substrate surface using a high current.

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