The Nanochrome™ IV PARMS (Plasma Assisted Reactive Magnetron Sputtering), produces dielectric thin film layers by reactive magnetron sputtering with final reaction and film densification at the substrate surface using a high current, low energy ion source. Reactive operation results in faster deposition times, and operation at pressures lower than conventional sputtering provides higher film quality.
Films are made reactively from metal targets to produce highly dense, pure oxides and nitrides. The system uses either a zero crossing sputter supply for operation with single cathodes, or a low frequency AC.
Oxides that have been produced in the NC-IV, from conductive metal targets include Tantalum, Niobium, Titanium, Aluminum, Zirconium and Silicon. The films are suitable for the UV, VIS NIR, SWIR, and MWIR ranges. The system also produces transparent conductive AZO and ITO.
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