Pleiades Cluster System

pleiades cluster system

The PleiadesTM (Seven Sisters) Cluster System will accommodate your most demanding process requirements.  With capabilities of up to 7 chambers, the PleiadesTM allows flexibility and mixing of techniques from evaporation, electron beam, magnetron sputtering, ion beam sputtering and ion beam etching.

This system allows you to maintain UHV conditions for transfer of your substrates to perform a wide range of thin film processes.

PleiadesTM is a state-of-the-art cluster system capable of producing and etching thin films of II-VI materials on up to 100mm wafers. The system's central radial distribution chamber provides access to all satellite systems with telescopic transfer arm

Pleiades brochure

Pleiades Cluster System

Key Benefits
Pleiades Cluster System

  • Configurable and expandable system architecture to include up to seven independent systems and fully motorized transfer capability
  • Versatile design incorporating automatic thin film evaporation, sputter depositions and sample preparation modules, suited for dealing with low melting points, high vapor pressures and corrosive properties of demanding source materials

Helios Substrate Heater

Pleiades can easily cool full wafers to -90°C, while others may be held at temperatures up to 1000°C using our HeliosTM substrate heater.helios substrate heater








Load Lock Chamber

The load-lock chamber allows manual loading / unloading and storing of multiple sample carriers at one time. It can also be tailored to address corrosive and toxic properties of materials that can be accommodated in the machine.load lock chamber








Water-cooled Stage

  • Direct water-cooled stage with ability to etch at multiple angles in a single automated process etch
  • High-efficiency heating with exquisite radiative heat management
  • Both the heated and the water-cooled stages provide continuous rotation for maximized temperature uniformity across the waferwater-cooled stage









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